Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films

Kajikawa, Y. / Noda, S. / Komiyama, H. | British Library Online Contents | 2002

Characterization of polycrystalline silicon carbide films grown by atmospheric pressure chemical vapor deposition on polycrystalline silicon

Zorman, C. A. / Roy, S. / Wu, C.-H. et al. | British Library Online Contents | 1998

In situ boron doping of chemical-vapor-deposited diamond films

Jiang, X. / Willich, P. / Paul, M. et al. | British Library Online Contents | 1999

Characterization of reduced-pressure chemical vapor deposition polycrystalline silicon germanium deposited at temperatures

Sedky, S. / Witvrouw, A. / Caymax, M. et al. | British Library Online Contents | 2002

Large grain polycrystalline silicon via chemical vapor deposition

Beckloff, B. N. / Lackey, W. J. / Pickering, E. M. | British Library Online Contents | 1999