Characterization of polycrystalline silicon carbide films grown by atmospheric pressure chemical vapor deposition on polycrystalline silicon

Zorman, C. A. / Roy, S. / Wu, C.-H. et al. | British Library Online Contents | 1998

Large grain polycrystalline silicon via chemical vapor deposition

Beckloff, B. N. / Lackey, W. J. / Pickering, E. M. | British Library Online Contents | 1999

Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films

Kajikawa, Y. / Noda, S. / Komiyama, H. | British Library Online Contents | 2002

Nitrogen-Doping of Polycrystalline 3C-SiC Films Deposited by Low Pressure Chemical Vapor Deposition

Fu, X. A. / Trevino, J. / Mehregany, M. et al. | British Library Online Contents | 2006

Epitaxial nucleation of polycrystalline silicon carbide during chemical vapor deposition

Sheldon, B. W. / Besmann, T. M. / More, K. L. et al. | British Library Online Contents | 1993