On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation: Fid-Bau Portal

On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation

Pincik, E. / Kobayashi, H. / Hajossy, R. / Gleskova, H. / Takahashi, M. / Jergel, M. / Brunner, R. / Ortega, L. / Kucera, M. / Kral, M.

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On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation

Pincik, E. / Kobayashi, H. / Hajossy, R. / Gleskova, H. / Takahashi, M. / Jergel, M. / Brunner, R. / Ortega, L. / Kucera, M. / Kral, M.

On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation

Pincik, E. / Kobayashi, H. / Hajossy, R. / Gleskova, H. / Takahashi, M. / Jergel, M. / Brunner, R. / Ortega, L. / Kucera, M. / Kral, M.

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Title:

On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation

Contributors:

Pincik, E. (author) / Kobayashi, H. (author) / Hajossy, R. (author) / Gleskova, H. (author) / Takahashi, M. (author) / Jergel, M. (author) / Brunner, R. (author) / Ortega, L. (author) / Kucera, M. (author) / Kral, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 6697-6715

Publication date:

2007-01-01

Size:

19 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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