Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
New Diode Designs Compatible with Vertical 4H-SiC JFET Fabrication Process
New Diode Designs Compatible with Vertical 4H-SiC JFET Fabrication Process
New Diode Designs Compatible with Vertical 4H-SiC JFET Fabrication Process
Brosselard, P. (Autor:in) / Tournier, D. (Autor:in) / Vellvehi, M. (Autor:in) / Montserrat, J. (Autor:in) / Godignon, P. (Autor:in) / Millan, J. (Autor:in) / Wright, N. / Johnson, C. M. / Vassilevski, K. / Nikitina, I.
Silicon Carbide and Related Materials 2006 ; 1003-1006
MATERIALS SCIENCE FORUM ; 556/557
01.01.2007
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
A 600V Deep-Implanted Gate Vertical JFET
British Library Online Contents | 2004
|Demonstration of SiC Vertical Trench JFET Reliability
British Library Online Contents | 2012
|Silicon Carbide Vertical JFET Operating at High Temperature
British Library Online Contents | 2009
|Silicon Carbide Vertical JFET with Self-Aligned Nickel Silicide Contacts
British Library Online Contents | 2011
|Normally-Off 4H-SiC Vertical JFET with Large Current Density
British Library Online Contents | 2009
|