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Oxidation and removal mechanisms during chemical-mechanical planarization
Oxidation and removal mechanisms during chemical-mechanical planarization
Oxidation and removal mechanisms during chemical-mechanical planarization
Ng, D. ( Autor:in ) / Kulkarni, M. ( Autor:in ) / Johnson, J. ( Autor:in ) / Zinovev, A. ( Autor:in ) / Yang, D. ( Autor:in ) / Liang, H. ( Autor:in )
WEAR -LAUSANNE- ; 263 ; 1477-1483
01.01.2007
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11292
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