Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Influence of the plasma parameters and nitrogen addition on the electrical characteristics of DLC films deposited by inductively coupled plasma deposition
Influence of the plasma parameters and nitrogen addition on the electrical characteristics of DLC films deposited by inductively coupled plasma deposition
Influence of the plasma parameters and nitrogen addition on the electrical characteristics of DLC films deposited by inductively coupled plasma deposition
Mousinho, A. P. (Autor:in) / Mansano, R. D. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 189-192
01.01.2007
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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