Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature: Fid-Bau Portal

Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Wang, X. Q. / He, D. Y. / Li, J. S.

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Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Wang, X. Q. / He, D. Y. / Li, J. S.

Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Wang, X. Q. / He, D. Y. / Li, J. S.

Zugriff

Zugriff über TIB

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Titel:

Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Beteiligte:

Wang, X. Q. (Autor:in) / He, D. Y. (Autor:in) / Li, J. S. (Autor:in) / Pan, W. / Gong, J.

Erschienen in:

Proceedings of the Fourth China International Conference on High-Performance Ceramics (CICC-4) (Incorporating the Second International Workshop on Layered and Graded Materials and the First Satellite Symposium on Thermoelectrics) Chengdu, China, October 23 ∼ 26, 2005 ; 2228-2231

KEY ENGINEERING MATERIALS ; 336/338

Erscheinungsdatum:

01.01.2007

Format / Umfang:

4 pages

ISSN:

1013-9826

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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