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Stress-Assisted Atomic Migration in Thin Copper Films
Stress-Assisted Atomic Migration in Thin Copper Films
Stress-Assisted Atomic Migration in Thin Copper Films
Hanabusa, T. (Autor:in) / Kusaka, K. (Autor:in) / Kaneko, K. (Autor:in) / Sakata, O. (Autor:in) / Nishida, M. (Autor:in) / Zhou, Y. / Tu, S.-T. / Xie, X.
01.01.2007
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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