Copper-Based Metallization in ULSI Structures

Li, J. / Seidel, T. E. / Mayer, J. W. | British Library Online Contents | 1994

Electrochemically Deposited Copper for ULSI Technology

Shacham-Diamand, Y. / Electrochemical Society; Electrodeposition Division | British Library Conference Proceedings | 1995

Copper-Based Metallization for ULSI Applications

Li, J. / Blewer, R. S. / Mayer, J. W. | British Library Online Contents | 1993

Planarized Copper Multilevel Interconnections for ULSI Applications

Misawa, N. / Ohba, T. / Yagi, H. | British Library Online Contents | 1994

Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices

Hwang, H.-L. / Chen, P.-C. / Hsu, K. Y. J. | British Library Online Contents | 1996