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Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices
Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices
Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices
Hwang, H.-L. (Autor:in) / Chen, P.-C. (Autor:in) / Hsu, K. Y. J. (Autor:in)
APPLIED SURFACE SCIENCE ; 92 ; 180-192
01.01.1996
13 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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