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Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias
Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias
Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias
Niu, E. W. (author) / Li, L. (author) / Lv, G. H. (author) / Chen, H. (author) / Li, X. Z. (author) / Yang, X. Z. (author) / Yang, S. Z. (author)
APPLIED SURFACE SCIENCE ; 254 ; 3909-3914
2008-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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