Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
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Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD
Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD
Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD
Kim, B. (Autor:in) / Kim, S. Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 4546-4551
01.01.2008
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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