A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD
Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD
Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD
Kim, B. (author) / Kim, S. Y. (author)
APPLIED SURFACE SCIENCE ; 254 ; 4546-4551
2008-01-01
6 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Neural network modeling of PECVD silicon nitride films
| British Library Online Contents | 1999
Optical properties of boron nitride thin films deposited by microwave PECVD
| British Library Online Contents | 2001
Structural analysis of silicon oxynitride films deposited by PECVD
| British Library Online Contents | 2004
PECVD synthesis, optical and mechanical properties of silicon carbon nitride films
British Library Online Contents | 2015
Laser annealing study of PECVD deposited hydrogenated amorphous silicon carbon alloy films
| British Library Online Contents | 2007