Advanced front-end processes for the 45nm CMOS technology node

Collart, E. J. / Felch, S. B. / Graoui, H. et al. | British Library Online Contents | 2004

Ni based silicides for 45nm CMOS and beyond

Lauwers, A. / Kittl, J. A. / Van Dal, M. J. et al. | British Library Online Contents | 2004

Design of ultra low power novel 3-bit flash ADC in 45nm CMOS technology

Das, Moushumi / Nath, Bipasha / Sarkar, Durba et al. | IEEE | 2015

SiGe nanostructures by selective epitaxy and self-assembling

Vescan, L. | British Library Online Contents | 2001

Selective SiGe epitaxy by rtcvd for new device architectures

Ribot, P. / Monfray, S. / Skotnicki, T. et al. | British Library Online Contents | 2002