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Enhanced growth of low-resistivity cobalt silicide by using a Co/Au/Co trilayer film on Si0.8Ge0.2 virtual substrate
Enhanced growth of low-resistivity cobalt silicide by using a Co/Au/Co trilayer film on Si0.8Ge0.2 virtual substrate
Enhanced growth of low-resistivity cobalt silicide by using a Co/Au/Co trilayer film on Si0.8Ge0.2 virtual substrate
Cheng, S. L. (Autor:in) / Chen, H. Y. (Autor:in) / Lee, S. W. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 6211-6214
01.01.2008
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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