RF plasma treatment of shallow ion-implanted layers of germanium

Okholin, P.N. / Glotov, V.I. / Nazarov, A.N. et al. | British Library Online Contents | 2016

Implant temperature dependence of transient-enhanced diffusion in silicon (100) implanted with low-energy arsenic ions

Whelan, S. / Armour, D. G. / Van den Berg, J. A. et al. | British Library Online Contents | 2000

Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation

Dusch, A. / Marcon, J. / Masmoudi, K. et al. | British Library Online Contents | 2001

Shallow mixing layers

Prooijen, Bram | TIBKAT | 2004

Models for the Turbulent Diffusion Terms of Shallow Water Equations

Castanedo, S. / Medina, R. / Mendez, F. J. | British Library Online Contents | 2005