Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
High Channel Mobility of 4H-SiC MOSFET Fabricated on Macro-Stepped Surface
High Channel Mobility of 4H-SiC MOSFET Fabricated on Macro-Stepped Surface
High Channel Mobility of 4H-SiC MOSFET Fabricated on Macro-Stepped Surface
Masuda, T. (Autor:in) / Harada, S. (Autor:in) / Tsuno, T. (Autor:in) / Namikawa, Y. (Autor:in) / Kimoto, T. (Autor:in)
MATERIALS SCIENCE FORUM ; 600/603 ; 695-698
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
High Channel Mobility of MOSFET Fabricated on 4H-SiC (11-20) Face Using Wet Annealing
British Library Online Contents | 2009
|2DEG HEMT Mobility vs Inversion Channel MOSFET Mobility
British Library Online Contents | 2010
|Fabrication of 4H-SiC p-Channel MOSFET with High Channel Mobility
British Library Online Contents | 2006
|British Library Online Contents | 2003
|3C-SiC MOSFET with High Channel Mobility and CVD Gate Oxide
British Library Online Contents | 2011
|