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Influence of Substrate Preparation and Epitaxial Growth Parameters on the Dislocation Densities in 4H-SiC Epitaxial Layers
Influence of Substrate Preparation and Epitaxial Growth Parameters on the Dislocation Densities in 4H-SiC Epitaxial Layers
Influence of Substrate Preparation and Epitaxial Growth Parameters on the Dislocation Densities in 4H-SiC Epitaxial Layers
Kallinger, B. (Autor:in) / Thomas, B. (Autor:in) / Friedrich, J. (Autor:in)
MATERIALS SCIENCE FORUM ; 600/603 ; 143-146
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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