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Influence of substoichiometer on the laser-induced damage characters of HfO2 thin films
Influence of substoichiometer on the laser-induced damage characters of HfO2 thin films
Influence of substoichiometer on the laser-induced damage characters of HfO2 thin films
APPLIED SURFACE SCIENCE ; 255 ; 4646-4649
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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