Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Electrical Characterization of Al Implanted 4H-SiC Layers by Four Point Probe and Scanning Capacitance Microscopy
Electrical Characterization of Al Implanted 4H-SiC Layers by Four Point Probe and Scanning Capacitance Microscopy
Electrical Characterization of Al Implanted 4H-SiC Layers by Four Point Probe and Scanning Capacitance Microscopy
Giannazzo, F. (Autor:in) / Rambach, M. (Autor:in) / Salinas, D. (Autor:in) / Roccaforte, F. (Autor:in) / Raineri, V. (Autor:in)
MATERIALS SCIENCE FORUM ; 615/617 ; 457-460
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Activation Study of Implanted N^+ in 6H-SiC by Scanning Capacitance Microscopy
British Library Online Contents | 2003
|Dopant profile measurements in ion implanted 6H-SiC by scanning capacitance microscopy
British Library Online Contents | 2001
|Local electrical characterization of SOI wafers by scanning probe microscopy
British Library Online Contents | 2002
|Wear resistance of C^+-implanted silicon investigated by scanning probe microscopy
British Library Online Contents | 1993
|British Library Online Contents | 2009
|