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Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates
Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates
Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates
Han, J. H. (Autor:in) / No, Y. S. (Autor:in) / Kim, T. W. (Autor:in) / Lee, J. Y. (Autor:in) / Kim, J. Y. (Autor:in) / Choi, W. K. (Autor:in)
APPLIED SURFACE SCIENCE ; 256 ; 1920-1924
01.01.2010
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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