Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates: Fid-Bau Portal

Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates

Han, J. H. / No, Y. S. / Kim, T. W. / Lee, J. Y. / Kim, J. Y. / Choi, W. K.

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Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates

Han, J. H. / No, Y. S. / Kim, T. W. / Lee, J. Y. / Kim, J. Y. / Choi, W. K.

Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates

Han, J. H. / No, Y. S. / Kim, T. W. / Lee, J. Y. / Kim, J. Y. / Choi, W. K.

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Title:

Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates

Contributors:

Han, J. H. (author) / No, Y. S. (author) / Kim, T. W. (author) / Lee, J. Y. (author) / Kim, J. Y. (author) / Choi, W. K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 256 ; 1920-1924

Publication date:

2010-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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