A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Assessment of interface roughness during plasma etching through the use of real-time ellipsometry
Assessment of interface roughness during plasma etching through the use of real-time ellipsometry
Assessment of interface roughness during plasma etching through the use of real-time ellipsometry
Han, C. Y. (author) / Lai, C. W. (author) / Chao, Y. F. (author) / Leou, K. C. (author) / Lin, T. L. (author)
APPLIED SURFACE SCIENCE ; 257 ; 2536-2539
2011-01-01
4 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Real time ellipsometry for monitoring plasma-assisted epitaxial growth of GaN
| British Library Online Contents | 2006
In situ real time ellipsometry monitoring during GaN epilayers processing
| British Library Online Contents | 1999
Pressure controlled surface roughness of SiC plasma etching
| British Library Online Contents | 2004
Theoretical analysis of silicon surface roughness induced by plasma etching
| British Library Online Contents | 2013
| British Library Online Contents | 2018