Structural and optical properties study of nanocrystalline Si (nc-Si) thin films deposited on porous aluminum by plasma enhanced chemical vapor deposition: Fid-Bau Portal

Structural and optical properties study of nanocrystalline Si (nc-Si) thin films deposited on porous aluminum by plasma enhanced chemical vapor deposition

Ghrib, M. / Gaidi, M. / Khedher, N. / Ghrib, T. / Salem, M. B. / Ezzaouia, H.

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Structural and optical properties study of nanocrystalline Si (nc-Si) thin films deposited on porous aluminum by plasma enhanced chemical vapor deposition

Ghrib, M. / Gaidi, M. / Khedher, N. / Ghrib, T. / Salem, M. B. / Ezzaouia, H.

Structural and optical properties study of nanocrystalline Si (nc-Si) thin films deposited on porous aluminum by plasma enhanced chemical vapor deposition

Ghrib, M. / Gaidi, M. / Khedher, N. / Ghrib, T. / Salem, M. B. / Ezzaouia, H.

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Titel:

Structural and optical properties study of nanocrystalline Si (nc-Si) thin films deposited on porous aluminum by plasma enhanced chemical vapor deposition

Beteiligte:

Ghrib, M. ( Autor:in ) / Gaidi, M. ( Autor:in ) / Khedher, N. ( Autor:in ) / Ghrib, T. ( Autor:in ) / Salem, M. B. ( Autor:in ) / Ezzaouia, H. ( Autor:in )

Erschienen in:

APPLIED SURFACE SCIENCE ; 257 ; 3998-4003

Erscheinungsdatum:

01.01.2011

Format / Umfang:

6 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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