Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing
Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing
Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing
Chandra, S. V. J. (Autor:in) / Choi, C.-J. (Autor:in) / Uthanna, S. (Autor:in) / Rao, G. M. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 13 ; 245-251
01.01.2010
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2008
|Post-deposition annealing of RF-sputtered zinc-oxide films
British Library Online Contents | 1993
|Post-deposition annealing of RF-sputtered zinc-oxide films
British Library Online Contents | 1993
|Properties of radio frequency magnetron sputtered silicon dioxide films
British Library Online Contents | 1996
|British Library Online Contents | 2014
|