Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Growth, microstructure and electrical properties of sputter-deposited hafnium oxide (HfO2) thin films grown using a HfO2 ceramic target
Growth, microstructure and electrical properties of sputter-deposited hafnium oxide (HfO2) thin films grown using a HfO2 ceramic target
Growth, microstructure and electrical properties of sputter-deposited hafnium oxide (HfO2) thin films grown using a HfO2 ceramic target
Aguirre, B. (Autor:in) / Vemuri, R. S. (Autor:in) / Zubia, D. (Autor:in) / Engelhard, M. H. (Autor:in) / Shutthananadan, V. (Autor:in) / Bharathi, K. K. (Autor:in) / Ramana, C. V. (Autor:in)
APPLIED SURFACE SCIENCE ; 257 ; 2197-2202
01.01.2011
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2018
|Trends of structural and electrical properties in atomic layer deposited HfO2 films
British Library Online Contents | 2004
|Growth and characterization of MOMBE grown HfO2
British Library Online Contents | 2005
|Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer
British Library Online Contents | 2012
|Microstructure and interfacial properties of HfO2-Al2O3 nanolaminate films
British Library Online Contents | 2006
|