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Material Removal Rate Control in Open-Air Type Plasma Chemical Vaporization Machining Using Optical Actinometry
Material Removal Rate Control in Open-Air Type Plasma Chemical Vaporization Machining Using Optical Actinometry
Material Removal Rate Control in Open-Air Type Plasma Chemical Vaporization Machining Using Optical Actinometry
Yamamoto, Y. (Autor:in) / Hata, Y. (Autor:in) / Hosoda, M. (Autor:in) / Oshikane, Y. (Autor:in) / Yamamura, K. (Autor:in)
KEY ENGINEERING MATERIALS ; 523/524 ; 267-271
01.01.2012
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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