Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Effect of electric field on doped amorphous silicon thin films during Ni induced lateral crystallization
Effect of electric field on doped amorphous silicon thin films during Ni induced lateral crystallization
Effect of electric field on doped amorphous silicon thin films during Ni induced lateral crystallization
Ahn, J. S. (Autor:in) / Kim, D. k. (Autor:in) / Joo, S. K. (Autor:in)
MATERIALS LETTERS ; 93 ; 233-236
01.01.2013
4 pages
Aufsatz (Zeitschrift)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Dopant effect on in situ doped metal-induced lateral crystallization of amorphous silicon films
British Library Online Contents | 2005
|Nickel induced lateral crystallization behavior of amorphous silicon films
British Library Online Contents | 2005
|AlCl3-induced crystallization of amorphous silicon thin films
British Library Online Contents | 2008
|Nickel Metal Induced Lateral Crystallization of Patterned Amorphous Silicon Thin Film
British Library Online Contents | 2007
|British Library Online Contents | 2005
|