Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask: Fid-Bau Portal

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask

Huda, M. / Liu, J. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

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Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask

Huda, M. / Liu, J. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask

Huda, M. / Liu, J. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

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Titel:

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask

Beteiligte:

Huda, M. (Autor:in) / Liu, J. (Autor:in) / Mohamad, Z.B. (Autor:in) / Yin, Y. (Autor:in) / Hosaka, S. (Autor:in) / Abdullah, M. / Okuyama, K. / Khairurrijal

Erschienen in:

Nanotechnology Applications in Energy and Environment ; 133-136

MATERIALS SCIENCE FORUM ; 737

Erscheinungsdatum:

01.01.2013

Format / Umfang:

4 pages

ISSN:

0255-5476

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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