Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask: Fid-Bau Portal

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask

Huda, M. / Liu, J. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

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Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask

Huda, M. / Liu, J. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask

Huda, M. / Liu, J. / Mohamad, Z.B. / Yin, Y. / Hosaka, S.

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Title:

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF~4 Etching with Carbon Hard Mask (CHM) as Mask

Contributors:

Huda, M. (author) / Liu, J. (author) / Mohamad, Z.B. (author) / Yin, Y. (author) / Hosaka, S. (author) / Abdullah, M. / Okuyama, K. / Khairurrijal

Published in:

Nanotechnology Applications in Energy and Environment ; 133-136

MATERIALS SCIENCE FORUM ; 737

Publication date:

2013-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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