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Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension

Veliadis, V. / Snook, M. / Hearne, H. / Nechay, B. / Woodruff, S. / Lavoie, C. / Kirby, C. / Imhoff, E. / White, J. / Davis, S.M.

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Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension

Veliadis, V. / Snook, M. / Hearne, H. / Nechay, B. / Woodruff, S. / Lavoie, C. / Kirby, C. / Imhoff, E. / White, J. / Davis, S.M.

Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension

Veliadis, V. / Snook, M. / Hearne, H. / Nechay, B. / Woodruff, S. / Lavoie, C. / Kirby, C. / Imhoff, E. / White, J. / Davis, S.M.

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Ähnliche Titel

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Titel:

Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension

Beteiligte:

Veliadis, V. (Autor:in) / Snook, M. (Autor:in) / Hearne, H. (Autor:in) / Nechay, B. (Autor:in) / Woodruff, S. (Autor:in) / Lavoie, C. (Autor:in) / Kirby, C. (Autor:in) / Imhoff, E. (Autor:in) / White, J. (Autor:in) / Davis, S.M. (Autor:in)

Erschienen in:

Silicon Carbide and Related Materials 2012 Selected, peer reviewed papers from the 9th European Conference on Silicon Carbide and Related Materials (ECSCRM 2012), September 2-6, 2012, St. Petersburg, Russian Federation ; 855-858

MATERIALS SCIENCE FORUM ; 740/742

Erscheinungsdatum:

01.01.2013

Format / Umfang:

4 pages

ISSN:

0255-5476

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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