Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension: Fid-Bau Portal

Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension

Veliadis, V. / Snook, M. / Hearne, H. / Nechay, B. / Woodruff, S. / Lavoie, C. / Kirby, C. / Imhoff, E. / White, J. / Davis, S.M.

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Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension

Veliadis, V. / Snook, M. / Hearne, H. / Nechay, B. / Woodruff, S. / Lavoie, C. / Kirby, C. / Imhoff, E. / White, J. / Davis, S.M.

Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension

Veliadis, V. / Snook, M. / Hearne, H. / Nechay, B. / Woodruff, S. / Lavoie, C. / Kirby, C. / Imhoff, E. / White, J. / Davis, S.M.

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Title:

Process Tolerant Single Photolithography/Implantation 120-Zone Junction Termination Extension

Contributors:

Veliadis, V. (author) / Snook, M. (author) / Hearne, H. (author) / Nechay, B. (author) / Woodruff, S. (author) / Lavoie, C. (author) / Kirby, C. (author) / Imhoff, E. (author) / White, J. (author) / Davis, S.M. (author)

Published in:

Silicon Carbide and Related Materials 2012 Selected, peer reviewed papers from the 9th European Conference on Silicon Carbide and Related Materials (ECSCRM 2012), September 2-6, 2012, St. Petersburg, Russian Federation ; 855-858

MATERIALS SCIENCE FORUM ; 740/742

Publication date:

2013-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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