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Enhanced tunability of the composition in silicon oxynitride thin films by the reactive gas pulsing process
Enhanced tunability of the composition in silicon oxynitride thin films by the reactive gas pulsing process
Enhanced tunability of the composition in silicon oxynitride thin films by the reactive gas pulsing process
Aubry, E. (Autor:in) / Weber, S. (Autor:in) / Billard, A. (Autor:in) / Martin, N. (Autor:in)
APPLIED SURFACE SCIENCE ; 290 ; 148-153
01.01.2014
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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