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Demonstration of High Quality 4H-SiC Epitaxial Growth with Extremely Low Basal Plane Dislocation Density
Demonstration of High Quality 4H-SiC Epitaxial Growth with Extremely Low Basal Plane Dislocation Density
Demonstration of High Quality 4H-SiC Epitaxial Growth with Extremely Low Basal Plane Dislocation Density
Tanaka, T. (Autor:in) / Kawabata, N. (Autor:in) / Mitani, Y. (Autor:in) / Tomita, N. (Autor:in) / Tarutani, M. (Autor:in) / Kuroiwa, T. (Autor:in) / Toyoda, Y. (Autor:in) / Imaizumi, M. (Autor:in) / Sumitani, H. (Autor:in) / Yamakawa, S. (Autor:in)
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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