Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Conversion of Basal Plane Dislocations to Threading Edge Dislocations in Growth of Epitaxial Layers on 4H-SiC Substrates with a Vicinal Off-Angle
Conversion of Basal Plane Dislocations to Threading Edge Dislocations in Growth of Epitaxial Layers on 4H-SiC Substrates with a Vicinal Off-Angle
Conversion of Basal Plane Dislocations to Threading Edge Dislocations in Growth of Epitaxial Layers on 4H-SiC Substrates with a Vicinal Off-Angle
Masumoto, K. (Autor:in) / Ito, S. (Autor:in) / Goto, H. (Autor:in) / Yamaguchi, H. (Autor:in) / Tamura, K. (Autor:in) / Kudou, C. (Autor:in) / Nishio, J. (Autor:in) / Kojima, K. (Autor:in) / Ohno, T. (Autor:in) / Okumura, H. (Autor:in)
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2013
|British Library Online Contents | 2010
|British Library Online Contents | 2006
|Evolution of Basal Plane Dislocations during 4H-SiC Epitaxial Growth
British Library Online Contents | 2009
|Bending of Basal-Plane Dislocations in VPE Grown 4H-SiC Epitaxial Layers
British Library Online Contents | 2002
|