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Epitaxial Growth of Thick Multi-Layer 4H-SiC for the Fabrication of Very High-Voltage C-Face n-Channel IGBT
Epitaxial Growth of Thick Multi-Layer 4H-SiC for the Fabrication of Very High-Voltage C-Face n-Channel IGBT
Epitaxial Growth of Thick Multi-Layer 4H-SiC for the Fabrication of Very High-Voltage C-Face n-Channel IGBT
Miyazawa, T. ( Autor:in ) / Ji, S.Y. ( Autor:in ) / Kojima, K. ( Autor:in ) / Ishida, Y. ( Autor:in ) / Nakayama, K. ( Autor:in ) / Tanaka, A. ( Autor:in ) / Asano, K. ( Autor:in ) / Tsuchida, H. ( Autor:in ) / Okumura, H. / Harima, H. ... [mehr]
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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