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SiC-4H Epitaxial Layer Growth by Trichlorosilane (TCS) as Silicon Precursor at Very High Growth Rate
SiC-4H Epitaxial Layer Growth by Trichlorosilane (TCS) as Silicon Precursor at Very High Growth Rate
SiC-4H Epitaxial Layer Growth by Trichlorosilane (TCS) as Silicon Precursor at Very High Growth Rate
La Via, F. (Autor:in) / Izzo, G. (Autor:in) / Mauceri, M. (Autor:in) / Pistone, G. (Autor:in) / Condorelli, G. (Autor:in) / Perdicaro, L.M.S. (Autor:in) / Abbondanza, G. (Autor:in) / Portuese, F. (Autor:in) / Galvagno, G. (Autor:in) / Di Franco, S. (Autor:in)
MATERIALS SCIENCE FORUM ; 600/603 ; 123-126
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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