Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Characterization of colloidal silica abrasives with different sizes and their chemical-mechanical polishing performance on 4H-SiC (0001)
Characterization of colloidal silica abrasives with different sizes and their chemical-mechanical polishing performance on 4H-SiC (0001)
Characterization of colloidal silica abrasives with different sizes and their chemical-mechanical polishing performance on 4H-SiC (0001)
APPLIED SURFACE SCIENCE ; 307 ; 414-427
01.01.2014
14 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Chemical-mechanical polishing of copper and tantalum with silica abrasives
British Library Online Contents | 2001
|Chemical-Mechanical Polishing of Wafers with Copper Film by Nano-Scale Abrasives
British Library Online Contents | 2008
|Effects of mixed abrasives in chemical mechanical polishing of oxide films
British Library Online Contents | 2003
|British Library Online Contents | 2017
|British Library Online Contents | 2017
|