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Etching of new phase change material Ti"0"."5Sb"2Te"3 by Cl"2/Ar and CF"4/Ar inductively coupled plasmas
Etching of new phase change material Ti"0"."5Sb"2Te"3 by Cl"2/Ar and CF"4/Ar inductively coupled plasmas
Etching of new phase change material Ti"0"."5Sb"2Te"3 by Cl"2/Ar and CF"4/Ar inductively coupled plasmas
APPLIED SURFACE SCIENCE ; 311 ; 68-73
01.01.2014
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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