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Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency

Janoš, P. / Ederer, J. / Pilařová, V. r. / Henych, J. / Tolasz, J. / Milde, D. / Opletal, T.

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Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency

Janoš, P. / Ederer, J. / Pilařová, V. r. / Henych, J. / Tolasz, J. / Milde, D. / Opletal, T.

Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency

Janoš, P. / Ederer, J. / Pilařová, V. r. / Henych, J. / Tolasz, J. / Milde, D. / Opletal, T.

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Titel:

Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency

Beteiligte:

Janoš, P. (Autor:in) / Ederer, J. (Autor:in) / Pilařová, V. r. (Autor:in) / Henych, J. (Autor:in) / Tolasz, J. (Autor:in) / Milde, D. (Autor:in) / Opletal, T. (Autor:in)

Erschienen in:

WEAR -LAUSANNE- ; 362 ; 114-120

Erscheinungsdatum:

01.01.2016

Format / Umfang:

7 pages

ISSN:

0043-1648

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11292

Stavreva, Z. / Zeidler, D. / Ploetner, M. et al. | British Library Online Contents | 1997

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Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

Li, M. / Zhu, Y.W. / Li, J. et al. | British Library Online Contents | 2010

Kinematic Analysis of Chemical Mechanical Polishing and its Effect on Polishing Results

Kim, H. / Jeong, H. / Lee, S. et al. | British Library Online Contents | 2003

Polishing Mechanism of Glass Substrates with its Processing Characteristics by Cerium Oxide and Manganese Oxide Slurries

Yamazaki, T. / Doi, T.K. / Kurokawa, S. et al. | British Library Online Contents | 2010

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