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Structural, optical and dielectric properties of HfSiO films prepared by co-evaporation method
Structural, optical and dielectric properties of HfSiO films prepared by co-evaporation method
Structural, optical and dielectric properties of HfSiO films prepared by co-evaporation method
Yang, Chen (Autor:in) / Hang, Lingxia (Autor:in) / Xu, Junqi (Autor:in)
Materials science in semiconductor processing ; 29 ; 321-325
01.01.2015
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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