Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
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Analysis of high-k HfO~2 and HfSiO~4 dielectric films
Analysis of high-k HfO~2 and HfSiO~4 dielectric films
Analysis of high-k HfO~2 and HfSiO~4 dielectric films
Nieveen, W. (Autor:in) / Schueler, B. W. (Autor:in) / Goodman, G. (Autor:in) / Schnabel, P. (Autor:in) / Moskito, J. (Autor:in) / Mowat, I. (Autor:in) / Chao, G. (Autor:in)
APPLIED SURFACE SCIENCE ; 231/232 ; 556-560
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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