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The formation of a dielectric SiNxCy sealing layer using an atomic layer deposition technique
The formation of a dielectric SiNxCy sealing layer using an atomic layer deposition technique
The formation of a dielectric SiNxCy sealing layer using an atomic layer deposition technique
Kim, Doyoung (Autor:in) / Kim, Soo-Hyun (Autor:in) / Kim, Hyungjun (Autor:in)
Materials science in semiconductor processing ; 29 ; 139-142
01.01.2015
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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