Leakage current characteristics of metal (Ag,TiN,W)-Hf:Ta2O5/SiOxNy–Si structures

Novkovski, N. / Atanassova, E. | British Library Online Contents | 2015

Quantitative depth profiling of SiOxNy layers on Si

van Berkum, J. G. / Hopstaken, M. J. / Snijders, J. H. et al. | British Library Online Contents | 2003

Formation of silicon on plasma synthesized SiOxNy and reaction mechanism

Zhu, M. / Shi, X. / Chen, P. et al. | British Library Online Contents | 2005

SIMS and high-resolution RBS analysis of ultrathin SiOxNy films

Kimura, K. / Nakajima, K. / Kobayashi, H. et al. | British Library Online Contents | 2003

SiOxNy thin films with variable refraction index: Microstructural, chemical and mechanical properties

Godinho, V. / Haro, M. C. / Garcia-Lopez, J. et al. | British Library Online Contents | 2010