Damage and annealing recovery of boron-implanted ultra-shallow junction: The correlation between beam current and surface configuration: Fid-Bau Portal

Damage and annealing recovery of boron-implanted ultra-shallow junction: The correlation between beam current and surface configuration

Chang, Feng-Ming / Wu, Zong-Zhe / Lin, Yen-Fu / Kao, Li-Chi / Wu, Cheng-Ta / JangJian, Shiu-Ko / Chen, Yuan-Nian / Lo, Kuang Yao

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Damage and annealing recovery of boron-implanted ultra-shallow junction: The correlation between beam current and surface configuration

Chang, Feng-Ming / Wu, Zong-Zhe / Lin, Yen-Fu / Kao, Li-Chi / Wu, Cheng-Ta / JangJian, Shiu-Ko / Chen, Yuan-Nian / Lo, Kuang Yao

Damage and annealing recovery of boron-implanted ultra-shallow junction: The correlation between beam current and surface configuration

Chang, Feng-Ming / Wu, Zong-Zhe / Lin, Yen-Fu / Kao, Li-Chi / Wu, Cheng-Ta / JangJian, Shiu-Ko / Chen, Yuan-Nian / Lo, Kuang Yao

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Zugriff über TIB

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Titel:

Damage and annealing recovery of boron-implanted ultra-shallow junction: The correlation between beam current and surface configuration

Beteiligte:

Chang, Feng-Ming (Autor:in) / Wu, Zong-Zhe (Autor:in) / Lin, Yen-Fu (Autor:in) / Kao, Li-Chi (Autor:in) / Wu, Cheng-Ta (Autor:in) / JangJian, Shiu-Ko (Autor:in) / Chen, Yuan-Nian (Autor:in) / Lo, Kuang Yao (Autor:in)

Erschienen in:

Applied surface science ; 433 ; 160-165

Erscheinungsdatum:

01.01.2018

Format / Umfang:

6 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.44

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