Inductively coupled plasma etching of GaAs in Cl2/Ar, Cl2/Ar/O2 chemistries with photoresist mask

Liu, K. / Ren, X. m. / Huang, Y. q. et al. | British Library Online Contents | 2015

Inductively coupled plasma etching of III-V semiconductors in BCl"3-based chemistries - I. GaAs, GaN, GaP, GaSb and AlGaAs

Maeda, T. / Lee, J.W. / Shul, R.J. et al. | British Library Online Contents | 1999

Comparison of ICl- and IBr-based plasma chemistries for inductively coupled plasma etching of GaN, InN and AlN

Hahn, Y.B. / Hays, D.C. / Cho, H. et al. | British Library Online Contents | 1999

High selectivity Inductively Coupled Plasma etching of GaAs over InGaP

Hays, D. C. / Cho, H. / Lee, J. W. et al. | British Library Online Contents | 2000

Inductively coupled plasma etching of III-V semiconductors in BCl"3-based chemistries - II. InP, InGaAs, InGaAsP, InAs and AlInAs

Maeda, T. / Lee, J.W. / Shul, R.J. et al. | British Library Online Contents | 1999