Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Growth and characterization of amorphous boron nitride dielectric films on Si via RF sputtering at room temperature
Growth and characterization of amorphous boron nitride dielectric films on Si via RF sputtering at room temperature
Growth and characterization of amorphous boron nitride dielectric films on Si via RF sputtering at room temperature
Abbas, Qasim (Autor:in) / Liang, Hongwei (Autor:in) / Shi, Jianjun (Autor:in) / Chen, Yuanpeng (Autor:in) / Xia, Xiaochuan (Autor:in) / Ahmad, Aqrab ul (Autor:in) / Liu, Jianxun (Autor:in) / Du, Guotong (Autor:in)
MATERIALS LETTERS ; 227 ; 284-288
01.01.2018
5 pages
Aufsatz (Zeitschrift)
Unbekannt
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2018
|British Library Online Contents | 2018
|Characterization of low dielectric constant amorphous carbon nitride films
British Library Online Contents | 2000
|Preparation of fluorinated amorphous carbon nitride films by magnetron sputtering
British Library Online Contents | 2000
|Preparation of boron carbon nitride thin films by radio frequency magnetron sputtering
British Library Online Contents | 2006
|