Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Preparation method of tin gallium oxide ceramic target material for RPD thin film
The preparation method of the tin gallium oxide ceramic target material for the RPD thin film disclosed by the embodiment of the invention comprises the following steps: S1, taking a plurality of tin gallium oxide waste targets, and performing soaking treatment in a diluted hydrochloric acid solution; s2, grinding the waste tin gallium oxide target subjected to soaking treatment into powder, selecting the powder with the particle size smaller than 80-200 meshes as fine particles, and selecting the powder with the particle size smaller than 20-40 meshes and larger than 80-100 meshes as coarse particles; s3, mixing the coarse particles and the fine particles according to the volume ratio of (3-8): (1-5), and uniformly mixing with a polyvinyl alcohol aqueous solution to obtain powder with polyvinyl alcohol attached to the surfaces of the particles; s4, performing compression molding on the powder obtained in the step S3 to obtain a target biscuit; s5, performing isostatic pressing on the target material biscuit to obtain a low-density target material biscuit; and S6, the low-density target biscuit is subjected to degreasing-sintering integrated process treatment, and the tin gallium oxide ceramic target for the RPD thin film is obtained.
本发明实施例公开的用于RPD薄膜的氧化锡镓陶瓷靶材的制备方法，包括步骤：S1、取氧化锡镓废靶若干，在稀盐酸溶液中浸泡处理；S2、浸泡处理后的氧化锡镓废靶研磨成粉料，选取粒度小于80～200目的粉料为细颗粒料，选取粒度小于20～40目、大于80～100目的粉料为粗颗粒料；S3、将粗颗粒料与细颗粒料以体积比3～8:1～5混合，与聚乙烯醇水溶液混匀，得到颗粒表面附着有聚乙烯醇的粉料；S4、步骤S3得到的粉料模压成型，得到靶材素坯；S5、靶材素坯等静压压制，得到低密度靶材素坯；S6、低密度靶材素坯进行脱脂‑烧结一体化工艺处理，得到用于RPD薄膜的氧化锡镓陶瓷靶材。
Preparation method of tin gallium oxide ceramic target material for RPD thin film
The preparation method of the tin gallium oxide ceramic target material for the RPD thin film disclosed by the embodiment of the invention comprises the following steps: S1, taking a plurality of tin gallium oxide waste targets, and performing soaking treatment in a diluted hydrochloric acid solution; s2, grinding the waste tin gallium oxide target subjected to soaking treatment into powder, selecting the powder with the particle size smaller than 80-200 meshes as fine particles, and selecting the powder with the particle size smaller than 20-40 meshes and larger than 80-100 meshes as coarse particles; s3, mixing the coarse particles and the fine particles according to the volume ratio of (3-8): (1-5), and uniformly mixing with a polyvinyl alcohol aqueous solution to obtain powder with polyvinyl alcohol attached to the surfaces of the particles; s4, performing compression molding on the powder obtained in the step S3 to obtain a target biscuit; s5, performing isostatic pressing on the target material biscuit to obtain a low-density target material biscuit; and S6, the low-density target biscuit is subjected to degreasing-sintering integrated process treatment, and the tin gallium oxide ceramic target for the RPD thin film is obtained.
本发明实施例公开的用于RPD薄膜的氧化锡镓陶瓷靶材的制备方法，包括步骤：S1、取氧化锡镓废靶若干，在稀盐酸溶液中浸泡处理；S2、浸泡处理后的氧化锡镓废靶研磨成粉料，选取粒度小于80～200目的粉料为细颗粒料，选取粒度小于20～40目、大于80～100目的粉料为粗颗粒料；S3、将粗颗粒料与细颗粒料以体积比3～8:1～5混合，与聚乙烯醇水溶液混匀，得到颗粒表面附着有聚乙烯醇的粉料；S4、步骤S3得到的粉料模压成型，得到靶材素坯；S5、靶材素坯等静压压制，得到低密度靶材素坯；S6、低密度靶材素坯进行脱脂‑烧结一体化工艺处理，得到用于RPD薄膜的氧化锡镓陶瓷靶材。
Preparation method of tin gallium oxide ceramic target material for RPD thin film
用于RPD薄膜的氧化锡镓陶瓷靶材的制备方法
CHEN JIE (Autor:in) / WANG SHI (Autor:in) / WANG YANYU (Autor:in) / WANG HAILONG (Autor:in) / SUN BENSHUANG (Autor:in) / HE JILIN (Autor:in)
14.05.2024
Patent
Elektronische Ressource
Chinesisch
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