Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
High-uniformity ITO target material and preparation method thereof
The invention relates to the technical field of ITO target materials, and discloses a high-uniformity ITO target material and a preparation method thereof. The high-uniformity ITO target material is prepared from the following raw materials in parts by weight: 96.5 to 99.5 parts of ITO powder and 0.5 to 3.5 parts of Cu/Ni nano composite, wherein the weight ratio of indium oxide to tin oxide in the ITO powder is (8.8-9.3): 1. By adopting the specific raw materials and proportion, the prepared ITO target material is excellent in comprehensive performance, and the problems that an internal microstructure of an existing target material is not uniform, and deformation, warping, cracking and the like are prone to occurring in the sintering process can be effectively solved.
本申请涉及ITO靶材技术领域，本申请公开了一种高均匀性ITO靶材及其制备方法。一种高均匀性ITO靶材，包括以下重量份数原料：ITO粉体96.5‑99.5份，Cu/Ni纳米复合物0.5‑3.5份；其中，ITO粉体中氧化铟和氧化锡的重量比为8.8‑9.3:1。本申请采用特定的原料以及配比，制备得到的ITO靶材综合性能优异，可有效地解决现有靶材内部微观组织不均匀以及在烧结过程中容易产生变形、翘曲、开裂等问题。
High-uniformity ITO target material and preparation method thereof
The invention relates to the technical field of ITO target materials, and discloses a high-uniformity ITO target material and a preparation method thereof. The high-uniformity ITO target material is prepared from the following raw materials in parts by weight: 96.5 to 99.5 parts of ITO powder and 0.5 to 3.5 parts of Cu/Ni nano composite, wherein the weight ratio of indium oxide to tin oxide in the ITO powder is (8.8-9.3): 1. By adopting the specific raw materials and proportion, the prepared ITO target material is excellent in comprehensive performance, and the problems that an internal microstructure of an existing target material is not uniform, and deformation, warping, cracking and the like are prone to occurring in the sintering process can be effectively solved.
本申请涉及ITO靶材技术领域，本申请公开了一种高均匀性ITO靶材及其制备方法。一种高均匀性ITO靶材，包括以下重量份数原料：ITO粉体96.5‑99.5份，Cu/Ni纳米复合物0.5‑3.5份；其中，ITO粉体中氧化铟和氧化锡的重量比为8.8‑9.3:1。本申请采用特定的原料以及配比，制备得到的ITO靶材综合性能优异，可有效地解决现有靶材内部微观组织不均匀以及在烧结过程中容易产生变形、翘曲、开裂等问题。
High-uniformity ITO target material and preparation method thereof
一种高均匀性ITO靶材及其制备方法
DING JINDUO (Autor:in) / YANG JINMING (Autor:in) / GE CHUNQIAO (Autor:in) / CHEN LU (Autor:in) / LI QIANG (Autor:in)
14.06.2024
Patent
Elektronische Ressource
Chinesisch
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