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HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL AND HOLLOW CYLINDRICAL SPUTTERING TARGET

ISHIDA SHINTARO

Abstract

실시형태에 관련된 세라믹스 원통형 타깃재는, 내주면의 표면 조도 Ra 가 1.2 ㎛ 이하이다.

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HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL AND HOLLOW CYLINDRICAL SPUTTERING TARGET

ISHIDA SHINTARO

Abstract

실시형태에 관련된 세라믹스 원통형 타깃재는, 내주면의 표면 조도 Ra 가 1.2 ㎛ 이하이다.

HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL AND HOLLOW CYLINDRICAL SPUTTERING TARGET

ISHIDA SHINTARO

Abstract

실시형태에 관련된 세라믹스 원통형 타깃재는, 내주면의 표면 조도 Ra 가 1.2 ㎛ 이하이다.

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Titel:

HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL AND HOLLOW CYLINDRICAL SPUTTERING TARGET

Weitere Titelangaben:

세라믹스 원통형 타깃재 및 원통형 스퍼터링 타깃

Beteiligte:

ISHIDA SHINTARO (Autor:in)

Erscheinungsdatum:

06.11.2017

Medientyp:

Patent

Format:

Elektronische Ressource

Sprache:

Koreanisch

Klassifikation:

IPC: C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / C04B Kalk , LIME

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